POSITIVE TYPE PHOTORESIST COMPOSITION - Fuji Photo Film Co., Ltd.

Title:

POSITIVE TYPE PHOTORESIST COMPOSITION

Document Type and Number:

Japanese Patent JP3444844

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a positive type photoresist composition which ensures improved line edge roughness and suppressed occurrence of development defects in the production of a semiconductor device.
SOLUTION: The positive type photoresist composition contains a resin containing specified repeating structural units and having a velocity of dissolution in an alkali developing solution increased by the action of an acid and a compound which generates the acid when irradiated with active light or radiation.

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Inventors:

Kenichiro Sato

Application Number:

JP2000215574A

Publication Date:

September 08, 2003

Filing Date:

July 17, 2000

Export Citation:

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Assignee:

Fuji Photo Film Co., Ltd.

International Classes:

G03F7/039; C08F16/12; C08F16/36; C08F20/10; C08F28/04; C08F32/00; C08K5/00; C08K5/16; C08L45/00; C08L101/00; H01L21/027; (IPC1-7): G03F7/039; H01L21/027

Domestic Patent References:

JP11305444A
JP2000159758A
JP200026446A
JP2001188346A
JP2001240625A
JP2002116546A
JP2002296783A
JP2001142213A
JP2002131917A

Attorney, Agent or Firm:

Shohei Oguri (4 outside)

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