Title:
POSITIVE TYPE RADIATION SENSITIVE MIXTURE
Document Type and Number:
Japanese Patent JP3300089
Kind Code:
B2
Abstract:
PURPOSE: To provide the novel mixture which can be developed by aq. alkaline soln., has a stable acid latent image, is for production of semiconductor structure and has high radiation sensitivity in a short wavelength UV region by incorporating a binder which is insoluble in water and is soluble in aq. alkaline soln. and specific compds. into the mixture.
CONSTITUTION: This mixture contains, as essential components, binder a which is insoluble in water and is soluble in aq. alkaline soln., compd. b which has at least one bonds cleavable by an acid, compd. c which generates an acid by radiation and basic sulfonium compd. d. These component a to d are used as the mixtures respectively composed of one or more kinds thereof. The compds. expressed by formula I to formula IV are preferably used as the basic sulfonium compd. among these components. In the formulas, R1 to R3 signify C1 to C18 alkyl, etc.; R4 to R7 denote C1 to C4 alkyl, alkoxy, etc.; Y signifies [CH2]n where n=0 or 1, or 0 or S; X is a basic anion, PKB value of which is -3 to +5.
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Inventors:
Claus, Jürgen, Sibera
Takanori Kudo
Masaya Masuda
Yoshiaki Kinoshita
Natsumi Suehiro
Muniratuna, Padmanavan
Hiroshi Okazaki
Gen Endo
Ralph and Damel
Takanori Kudo
Masaya Masuda
Yoshiaki Kinoshita
Natsumi Suehiro
Muniratuna, Padmanavan
Hiroshi Okazaki
Gen Endo
Ralph and Damel
Application Number:
JP2575393A
Publication Date:
July 08, 2002
Filing Date:
February 15, 1993
Export Citation:
Assignee:
Clariant International Limited
International Classes:
G03F7/004; G03F7/028; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP5181264A | ||||
| JP3103854A | ||||
| JP3153257A |
Attorney, Agent or Firm:
Kazuo Sato (2 outside)