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Title:
ポジ型感放射線性樹脂組成物
Document Type and Number:
Japanese Patent JP4360264
Kind Code:
B2
Abstract:
A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali when the acid-dissociable group dissociates is disclosed. wherein R1 and R2 are individually halogen atom, methyl, cyano, or nitro group, X is a C1-20 organic group, and h and i are 0-4. The resin composition is useful as a chemically amplified positive-tone resist excelling in focal depth allowance, sensitivity, resolution, pattern profile, and PED stability.

Inventors:
Tomoki Nagai
Takayuki Tsuji
Application Number:
JP2004135912A
Publication Date:
November 11, 2009
Filing Date:
April 30, 2004
Export Citation:
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Assignee:
JSR CORPORATION
International Classes:
G03F7/004; G03C1/492; G03F7/039; G03F7/20; H01L21/027
Domestic Patent References:
JP2002265446A
JP2002162746A
JP2004069857A
JP11072921A
Attorney, Agent or Firm:
Toshiaki Fukuzawa