Title:
POSITIVE TYPE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2002090991
Kind Code:
A
Abstract:
To provide a superior positive type photoresist composition excellent in resolving power and developability and ensuring suppressed jumping of isolated patterns.
The positive type resist composition contains an alkali-soluble resin, a 1,2-quinonediazido compound and a high molecular compound having a fluoroaliphatic group derived from a specified fluoroaliphatic compound in a side chain.
Inventors:
TAN SHIRO
SORORI TADAHIRO
SORORI TADAHIRO
Application Number:
JP2000277862A
Publication Date:
March 27, 2002
Filing Date:
September 13, 2000
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/004; C08K5/28; C08L101/00; C08L101/04; G03F7/022; G03F7/032; H01L21/027; (IPC1-7): G03F7/004; C08K5/28; C08L101/00; C08L101/04; G03F7/022; G03F7/032; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)