Title:
POSITIVE TYPE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2004077983
Kind Code:
A
Abstract:
To provide a positive type resist composition with high sensitivity and of high resolution which shows sufficient transparency when a light source of ≤160 nm, concretely of F2 excimer laser light (157 nm) is used.
The positive type resist composition contains (A) a resin which has at least one kind of a recursive unit having at least one radical of a particular structure, and has solubility to an alkaline developing solution increased by the action of acid and (B) a compound that generates acid by the action of active light or radiation.
Inventors:
SASAKI TOMOYA
MIZUTANI KAZUYOSHI
KANNA SHINICHI
MIZUTANI KAZUYOSHI
KANNA SHINICHI
Application Number:
JP2002240660A
Publication Date:
March 11, 2004
Filing Date:
August 21, 2002
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F212/14; C08F216/14; C08F218/10; C08F220/22; C08F232/04; H01L21/027; (IPC1-7): G03F7/039; C08F212/14; C08F216/14; C08F218/10; C08F220/22; C08F232/04; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Kuriu
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Kuriu
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