Title:
POSITIVE TYPE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JPH0352972
Kind Code:
A
Abstract:
PURPOSE: To obtain the subject composition for fine processing, containing an alkali-soluble phenolic resin, quinone diazide compound and a specific compound, useful for producing semiconductor elements, magnetic bubble memory elements, integrated circuits, etc.
CONSTITUTION: The objective composition containing (A) an alkali-soluble phenolic resin (e.g. an addition-condensation reaction product of phenols with aldehydes), (B) a quinone diazide compound (e.g. 1,2-benzoquinone diazide-4- sulfonic acid ester) and (C) a compound expressed by the formula (R1 to R4 are alkyl, aryl, aralkyl, alkoxy, nitro, halogen or alkenyl) [e.g. 2-(2'- hydroxyphenyl)-benzotriazole].
Inventors:
OIE MASAYUKI
KAWADA MASAJI
YAMADA TAKAMASA
KAWADA MASAJI
YAMADA TAKAMASA
Application Number:
JP18724489A
Publication Date:
March 07, 1991
Filing Date:
July 21, 1989
Export Citation:
Assignee:
NIPPON ZEON CO
International Classes:
C09D11/00; C09D11/02; C09D11/03; C09D11/10; C09D11/103; C09D11/106; (IPC1-7): C09D11/00; C09D11/02; C09D11/10
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