Title:
PREPARATION OF IVA GROUP AND VIA GROUP COMPOUND
Document Type and Number:
Japanese Patent JP2004323513
Kind Code:
A
Abstract:
To provide a method for producing a precursor to a IVA group and VIA group metal vapor deposit which is more safe in handling than ever and has a decomposition temperature controlled to be fit for a specific condition, when an organometallic compound, such as a IVA group and VIA group alkylmetal compound, which is used as a CVD precursor is prepared.
This method for preparing the IVA group and VIA group organometallic compound, particularly the IVA group organometallic compound, comprises using an amine and/or phosphine catalyst in a transalkylation process and conducting the preparation in a batch, semi-continuous or continuous manner.
Inventors:
SHENAI-KHATKHATE DEODATTA V
Application Number:
JP2004100148A
Publication Date:
November 18, 2004
Filing Date:
March 30, 2004
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C07B61/00; C07C391/00; C07C395/00; C07F5/00; C07F5/06; C07F7/08; C07F7/22; C07F7/30; C23C16/18; C23C16/28; H01L21/205; (IPC1-7): C07C391/00; C07C395/00; C07F7/08; C07F7/22; C07F7/30; H01L21/205
Domestic Patent References:
| JPH07316860A | 1995-12-05 | |||
| JPH06166691A | 1994-06-14 | |||
| JPH07316860A | 1995-12-05 | |||
| JPH06166691A | 1994-06-14 |
Foreign References:
| US3927060A | 1975-12-16 | |||
| US3927060A | 1975-12-16 |
Attorney, Agent or Firm:
Minoru Senda
Koji Hashimoto
Koji Hashimoto