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Title:
PREPARATION OF THIN CO-CR FILM
Document Type and Number:
Japanese Patent JPS6361421
Kind Code:
A
Abstract:

PURPOSE: To obtain a thin Co-Cr film which obviates the generation of abnormal projections on the surface by using Co and Cr as a target material and forming the thin Co-Cr film on a substrate to which a negative bias voltage is impressed by RF sputtering.

CONSTITUTION: The thin Co-Cr film is formed on the substrate by the RF sputtering using the Co-Cr alloy target. The negative bias voltage (10W100V) is impressed to the substrate at this time. The abnormal growth of the thin film is reduced by the impression of such negative bias voltage.


Inventors:
HIRONO SHIGERU
FURUYA AKINORI
OTANI YOSHIMITSU
TERADA AKIRA
Application Number:
JP20388186A
Publication Date:
March 17, 1988
Filing Date:
September 01, 1986
Export Citation:
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Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
C23C14/44; G11B5/64; G11B5/66; G11B5/706; G11B5/73; G11B5/85; G11B5/851; H01F41/18; (IPC1-7): C23C14/44; G11B5/66; G11B5/706; G11B5/85; H01F41/18
Attorney, Agent or Firm:
Shiro Mitsuishi