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Title:
PREPARING METHOD FOR SAMPLE FOR X-RAY MICROANALYZER
Document Type and Number:
Japanese Patent JPS5777943
Kind Code:
A
Abstract:

PURPOSE: To prevent a basic material component from exerting an influence, by a method wherein 2W3μ or less compound, educed in a metal, is extracted by a replica film, and after a carbon is vacuum-evaporated on the compound and is secured to a metal stand having a different component from that of the educed compound, the replica film is solved and analyzed.

CONSTITUTION: In case a compound 6, educed in a metal material 3, is 2W3μ or less being below a size which is possible for electronic rays to be throttled, the metal 3 is etched with an appropriate metal corrosion solution to float up the compound 6 which is extracted with a replica film 8, such as acetylecellulose films. A carbon 9 is vacuum-evaporated to a surface where the compound 6 is adhered to the film 8, and the work is secured to a metal 11, having a different compond from that of the compound, with an adhesive agent 10. After the film 8 is solved for the removal, X-rays, produced through the irradiation with an electronic ray beam, is detected. This prevents the ground 9 of the compound 6 from exerting any influence on an X-ray analyzer, which results in enabling to perform an accurate analysis of the component element of the compound 6.


Inventors:
HIROMATSU KAZUO
UEHARA KATSUKAGE
Application Number:
JP15372880A
Publication Date:
May 15, 1982
Filing Date:
November 04, 1980
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND LTD
International Classes:
G01N1/28; G01N1/36; (IPC1-7): G01N1/28
Domestic Patent References:
JPS5582943A1980-06-23
JPS5582944A1980-06-23



 
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