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Title:
PRESSUR-SENSITIVE ADHESIVE SHEET FOR RETAINING WAFER
Document Type and Number:
Japanese Patent JP2008063492
Kind Code:
A
Abstract:

To provide a self-adhesive sheet for retaining wafer which is a repeelable adhesive sheet having good expandability, by which chipping during dicing can be reduced and which has good repeelability without the reduction with the elapse of time and useful as a wafer-retaining sheet for dicing and the like.

The self-adhesive sheet for retaining a wafer is a self-adhesive sheet comprising 3 layers, that is, a base material layer comprising a thermoplastic resin and polymer particles having a multilayered structure, an intermediate layer comprising at least one resin selected from acrylic resins, polyamide resins and ethylene-vinyl alcohol resins and having 0.5-15 m thickness, and a radiation-curing type adhesive layer. In the sheet, the amount of migration of 2-15 functional compounds having 1,000-30,000 molecular weight to the base material layer after leaving the adhesive sheet at 50C for 2 weeks is 50%.


Inventors:
ASAI FUMITERU
HASHIMOTO KOICHI
Application Number:
JP2006244454A
Publication Date:
March 21, 2008
Filing Date:
September 08, 2006
Export Citation:
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Assignee:
NITTO DENKO CORP
International Classes:
C09J7/02; B32B7/06; B32B27/20; B32B27/28; B32B27/30; B32B27/34; C09J133/00; H01L21/301
Domestic Patent References:
JPS6254778A1987-03-10
JP2003003132A2003-01-08
JP2004214446A2004-07-29
JP2005303068A2005-10-27
JP2006049507A2006-02-16
JPH05235150A1993-09-10
JP2004330422A2004-11-25
JP2008050406A2008-03-06
JP2000223453A2000-08-11
JPH10335271A1998-12-18
JP2005116652A2005-04-28
JP2004079916A2004-03-11
JPH03205470A1991-09-06
Attorney, Agent or Firm:
Yukihisa Goto