Title:
予応力拘束ブロックと複合装甲構造
Document Type and Number:
Japanese Patent JP7203472
Kind Code:
B2
Abstract:
A prestress constrained block and a composite armor structure. The prestress constrained block comprises a filling platform body (11) and a constraint ring (12). The filling platform body (11) has a cross section of the same shape as that of an inner ring of the constraint ring (12), and is fixedly embedded in the inner ring of the constraint ring (12), an outer side wall of the filling platform body (11) and an inner ring wall of the constraint ring (12) being wedged tightly by means of the fit of conical surfaces or polygonal pyramid surfaces. The composite armor structure comprises at least one layer of armor plates. The armor plates comprise several prestress constrained blocks. For the prestress constrained blocks, several separate constrain rings that are spliced are used or a constraint ring with an integrated honeycomb structure is used. The prestress constrained block can apply a radial prestress to fragile materials such as ceramics, concrete or glass in a room temperature condition, and can adjust and control the magnitude of the prestress; and the prestress constrained block is suitable for applying prestress to components of various sizes and is easier to assemble, and damaged or broken components can be easily replaced, so that the prestress constrained block is applied to a plurality of protection fields such as armed helicopters, armored vehicles, ships, tanks, aircraft warehouses and missile-well covers.
Inventors:
Prince country
Son Ugan
Wang Jie
Son Ugan
Wang Jie
Application Number:
JP2022505641A
Publication Date:
January 13, 2023
Filing Date:
June 24, 2021
Export Citation:
Assignee:
QINGDAO UNIVERSITY OF TECHNOLOGY
International Classes:
F41H5/04; B32B7/08; B32B18/00
Domestic Patent References:
| JP2016180588A | ||||
| JP2008202876A |
Foreign References:
| GB2153406A | ||||
| KR102079185B1 | ||||
| US20040083880 | ||||
| CN1746609A | ||||
| US20160363418 | ||||
| CN105240356A |
Attorney, Agent or Firm:
TRY International Patent Attorney Corporation