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Patent Searching and Data


Title:
PRINTING METHOD FOR MINUTE PATTERN
Document Type and Number:
Japanese Patent JPS57115389
Kind Code:
A
Abstract:

PURPOSE: To print a minute pattern on an IC and an LSI, etc. with good stability and reproducibility, by using a printing block, whose projection is hydrophilic and depression is lipophilic and has a particular depth, and executing printing, after placing an oil-base ink on this, onto an object to be printed.

CONSTITUTION: On a substrate of glass, etc., a block (pattern), whose depression (line-drawing section) is lipophilic (such as, thin copper film, etc.) and projection is hydrophilic and the depression has a depth of 5W30μ, is formed by photoresist, etc. After applying moistening water by using this block, an oil-base ink is placed on the block by a roller, etc. And then, by pressing a transferring body against this without squeegeeing it, printing is achieved by transfer of the ink onto the transferring body, and by doing so, a minute pattern whose line width 100W300μ is formed.


Inventors:
YOSHIKAWA KAZUO
HIRAKAWA TAKAHITO
Application Number:
JP105781A
Publication Date:
July 17, 1982
Filing Date:
January 09, 1981
Export Citation:
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Assignee:
MIKURO GIJUTSU KENKYUSHO KK
International Classes:
B41M1/06; B41M3/00; H01L21/00; H01L21/02; H05K3/00; H05K3/12; (IPC1-7): B41M1/06; B41M3/00; H01L21/00; H05K3/00
Domestic Patent References:
JPS5131509A1976-03-17
JPS5136305A1976-03-27