Title:
プラズマ処理装置用のプロセス性能検査方法及び装置
Document Type and Number:
Japanese Patent JP5246836
Kind Code:
B2
Abstract:
A method inspects a process performance of a capacitively coupled plasma processing apparatus which generates a plasma for a plasma processing by applying a radio frequency power between a first electrode and a second electrode disposed in a processing vessel to face the first electrode in parallel. The method includes measuring an impedance of a radio frequency transmission path ranging from a rear surface of the first electrode to a ground potential part and sweeping a frequency to thereby obtain a frequency characteristic of a real resistance component of the impedance; reading a specific property value of a horn-like peak which appears from the frequency characteristic of the real resistance component; and determining efficaciousness or inferiority of the process performance of the plasma processing apparatus based on the peak property value.
Inventors:
Yohei Yamazawa
Application Number:
JP2007013577A
Publication Date:
July 24, 2013
Filing Date:
January 24, 2007
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/3065; H05H1/46
Domestic Patent References:
| JP2003282542A |
Attorney, Agent or Firm:
Filial piety Sasaki
Previous Patent: JPS5246835
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