Title:
高純度トリフルオロヨードメタンを生成するためのプロセス
Document Type and Number:
Japanese Patent JP7451527
Kind Code:
B2
Abstract:
The present disclosure provides a method for purifying trifluoroiodomethane. The method includes providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities; reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and at least one base selected from the group of an alkali metal carbonate and an alkali metal hydroxide; and separating at least some of the organic impurities from the process stream.
Inventors:
Chungon, Christian
Merkel, Daniel Sea.
One, Haiyu
Yang, Terris
Boromei, Pascal
Merkel, Daniel Sea.
One, Haiyu
Yang, Terris
Boromei, Pascal
Application Number:
JP2021530950A
Publication Date:
March 18, 2024
Filing Date:
December 03, 2019
Export Citation:
Assignee:
Honeywell International Inc.
International Classes:
C07C17/38; C07C19/16
Domestic Patent References:
| JP2008179602A |
Foreign References:
| CN108675914A |
Other References:
HWAHAK KONGHAK,2001年,39(2),144-149
Attorney, Agent or Firm:
Osamu Yamamoto
Toru Miyamae
Junichi Matsuo
Toyoharu Matsuda
Toru Miyamae
Junichi Matsuo
Toyoharu Matsuda
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