Title:
A PROCESS FOR TREATMENT OF WASTE GAS
Document Type and Number:
Japanese Patent JPS51129868
Kind Code:
A
Abstract:
PURPOSE: A waste gas treatment process for simple treatment of waste gas used in processes such as those for semi-conductor industry, for example, chemical vapor phase growth process.
Inventors:
ITOGA MASANAO
SATOU JIYUNJI
TANIGAWA EIKI
FUJIWARA TOSHIYASU
SATOU JIYUNJI
TANIGAWA EIKI
FUJIWARA TOSHIYASU
Application Number:
JP5390475A
Publication Date:
November 11, 1976
Filing Date:
May 07, 1975
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
B01D53/32; B01D53/00; B01D53/46; B01J19/08; (IPC1-7): B01D53/00; B01J1/14