PURPOSE: To improve the extent of μ-wave absorbing efficiency by installing an exciting coil group on an outer circumference at the front end of a plasma generating chamber and also an auxiliary exciting coil on an outer circumference in the intermediate part, respectively.
CONSTITUTION: A reactant gas is sealed in a plasma generating chamber 2, inducting a μ wave P, and direct currents are fed to a exciting coil 3 and an auxiliary exciting coil 10. The vicinity of an inlet port 5 turns to a high magnetic field through the coil group 3, so lowering along the incident direction. ECR plasma is produced in the chamber 2 at a position passed through an area where ECR conditions are satisfied, and a magnetic field once lowered from the ECR conditions is set down to the high magnetic field again by means of the auxiliary coil. At this time also, the ECR plasma is produced in a corresponding position passing through an inner part of the chamber 2. In consequence, the extent of the inducted μ wave is improved and, what is more, plasma density increases too.
TOYODA MASATO
ODERA HIROKI
MITSUBISHI ELECTRIC CORP
| JPS63213344A | 1988-09-06 |
Masuo Oiwa (2 outside)