PRODUCTION AND PRODUCTION APPARATUS OF SYNTHETIC QUARTZ GLASS, AND SYNTHETIC QUARTZ GLASS

Title:

PRODUCTION AND PRODUCTION APPARATUS OF SYNTHETIC QUARTZ GLASS, AND SYNTHETIC QUARTZ GLASS

Document Type and Number:

Japanese Patent JP2000281358

Kind Code:

A

Abstract:

To provide a method and an apparatus for producing synthetic quartz glass, in which an organosilicon compound is used as a raw material and which is capable of suppressing OH group concentration in the glass to a prescribed concentration.

In a method for producing the synthetic quartz glass which comprises reacting a raw material in a flame obtained by ejecting a first combustion gas to form fine particles of the synthetic quartz glass and depositing the particles of the synthetic quartz glass, an organosilicon compound is used as the raw material, and a second combustion gas which contains oxygen containing gas and hydrogen containing gas in such a manner that the flow rate of the oxygen containing gas is lower than that of the hydrogen containing gas, is added into the flame so as not to disturb the reaction of the raw material.

Inventors:

YAMAGUCHI TOMOHISA
FUJIWARA MASASHI
JINBO HIROKI

Application Number:

JP9210999A

Publication Date:

October 10, 2000

Filing Date:

March 31, 1999

Export Citation:

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Assignee:

NIKON CORP

International Classes:

C03B8/04; C03B19/14; C03B20/00; C03C3/06; G05D11/02; (IPC1-7): C03B8/04; C03B20/00; C03C3/06; G05D11/02

Attorney, Agent or Firm:

Takashi Ogaki

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