Title:
PRODUCTION OF CEPHALOSPORIN COMPOUND
Document Type and Number:
Japanese Patent JPH04173792
Kind Code:
A
Abstract:
PURPOSE: To obtain the subject compound useful as an antibacterial agent in high yield by reacting two specific kinds of compounds or their salts.
CONSTITUTION: The objective compound of formula III can be produced by reacting a compound of formula I [R2 is lower alkyl; R3 is (protected) hydroxy(lower)alkyl; R4 is (protected) amino; X is acid residue) or its salt (sodium salt, calcium salt or pyridine salt) with a compound of formula II or its salt in a solvent such as ethyl acetate or THF. The process is suitable for the synthesis of a compound labeled with a radioactive isotope.
Inventors:
SAKANE KAZUO
KAWABATA KOJI
OKI HIDENORI
KAWABATA KOJI
OKI HIDENORI
Application Number:
JP29856790A
Publication Date:
June 22, 1992
Filing Date:
November 02, 1990
Export Citation:
Assignee:
FUJISAWA PHARMACEUTICAL CO
International Classes:
C07D501/04; A61K31/545; A61K31/546; A61P31/04; C07D501/06; C07D501/46; (IPC1-7): A61K31/545; C07D501/04; C07D501/06; C07D501/46
Attorney, Agent or Firm:
Toshio Yoshikawa