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Patent Searching and Data


Title:
PRODUCTION OF COLOR FILTER AND ALIGNMENT MARK
Document Type and Number:
Japanese Patent JP3422923
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide high contrast under blue resist when using red alignment light.
SOLUTION: A red filter 24 and a red alignment mark 25 are simultaneously formed by performing exposure alignment while using a base alignment mark 22. When forming a blue filter 27, a filter pattern is formed on blue resist 26 by performing exposure alignment due to red alignment light 28 using the red alignment mark 25. Thus, when forming the blue filter 27, the red alignment mark 25 not to absorb the red alignment light is used so that the quantity of reflected light R1 and R1 ' concerning the red alignment mark 25 can be increased. As a result, the high contrast can be provided at the time of forming the blue filter 27.


Inventors:
Tetsuro Aoki
Application Number:
JP1254698A
Publication Date:
July 07, 2003
Filing Date:
January 26, 1998
Export Citation:
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Assignee:
Sharp Corporation
International Classes:
G02B5/20; G02F1/1335; G03F7/26; G03F9/00; G02F1/1333; (IPC1-7): G02B5/20; G03F7/26; G03F9/00
Domestic Patent References:
JP996712A
JP1289955A
JP6284908A
Attorney, Agent or Firm:
Aoyama Ryo (1 person outside)