PURPOSE: To advantageously form a polymer fit for a resist chemically amplified on the basis of chemical properties of styrene with substituents at the m- positions of the phenyl ring of styrene.
CONSTITUTION: A polymer for a chemically amplified resist typified by an m-substd. polymer is advantageously formed by allowing a 1st monomer having a 1st protective group to react with a 2nd monomer having a 2nd protective group. After polymn., the 2nd protective group is removed without practically affecting the 1st protective group. When the 1st protective group is an alkoxycarbonyl group and the 2nd protective group is a silyl ether group, the silyl ether group is converted into an OH group by treatment with lower alcohol in the presence of a very small amt. of an acid without affecting the alkoxycarbonyl group.
JIYANETSUTO MIHOKO KOMETANI
OMUKARAMU NARAMASU
ERUSA REICHIMANISU
KIYASURIN ERIZABESU UURITSUCHI
