Title:
PRODUCTION OF DIACETAL
Document Type and Number:
Japanese Patent JP3890792
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a diacetal at a high concentration, which is excellent in an industrial view point.
SOLUTION: A diacetal expressed by the formula [R1 and R2, and (m), (n) and (p) are each same as described in the description] is obtained by subjecting an aromatic aldehyde and a polyhydroxy alcohol of penta valent or more to condensation reaction in the presence of an acid catalyst, subsequently neutralizing the acid catalyst with an alkali hydroxide or the like, and performing processes of washing with water and drying. In this method, granules generated during the condensation reaction are crushed before and/or during the neutralization process.
Inventors:
Atsuo Tsuji
Masaru Okumura
Masaru Okumura
Application Number:
JP61699A
Publication Date:
March 07, 2007
Filing Date:
January 05, 1999
Export Citation:
Assignee:
Shin Nippon Rika Co., Ltd.
International Classes:
C07D493/04; (IPC1-7): C07D493/04
Domestic Patent References:
| JP4139189A | ||||
| JP1149789A | ||||
| JP58022157B1 |
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