Title:
PRODUCTION OF ETHENYLAMIDE COMPOUND
Document Type and Number:
Japanese Patent JP3246712
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain an ethenylamide compound in high purity and yield by reaction of a Schiff base compound with a haloacyl compound.
SOLUTION: This ethenylamide compound is expressed by formula I (R1 is a 6-14C aryl, O, S, N, etc.; R2 and R3 are each H or an alkyl; R4 is a 1-12C alkyl or 2-12C alkenyl), e.g. N-[(1-phenyl)ethenyl]-N-chloroaceto-2',6' dimethylanilide. The compound of formula I is obtained by dehydrohalogenation between a Schiff base compound of formula II [e.g. N-(1-methylbenzylidene)-2',6'- dimethylaniline] and a haloacyl compound of formula III (e.g. chloroacetyl chloride) under a reduced pressure of 0.3×102 to <1×105.
Inventors:
Shozo Kato
Shigeo Tamura
Shigeo Tamura
Application Number:
JP29709995A
Publication Date:
January 15, 2002
Filing Date:
November 15, 1995
Export Citation:
Assignee:
Tokuyama Corporation
International Classes:
C07D333/20; C07B43/06; C07C231/02; C07C231/10; C07C233/05; C07C233/07; C07C233/15; C07C233/18; C07C233/25; C07C233/65; C07C255/60; C07C323/32; C07C323/41; C07D207/335; C07D213/40; C07D307/52; (IPC1-7): C07C231/10; C07C233/05; C07C233/07; C07C233/15; C07C233/18; C07C233/25; C07C233/65; C07C255/60; C07C323/32; C07C323/41; C07D207/335; C07D213/40; C07D307/52; C07D333/20
Domestic Patent References:
| JP61165339A | ||||
| JP5115620A | ||||
| JP5862146A | ||||
| JP58947A | ||||
| JP52133905A |
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