PURPOSE: To obtain the particles having a high hardness, solvent resistance, and relatively uniform particle sizes by polymerizing a monomer mixture mainly comprising a styrenic monomer and an isocyanurate in an aq. emulsion and then removing coarse particles from the resultant product.
CONSTITUTION: A monomer mixture comprising 50-90 pts. wt. styrenic monomer selected from the group consisting of styrene, methylstyrene, and a halogenostyrene, 5-50 pts. wt. isocyanurate having an unsatd. hydrocarbon group, 0-15 pts. wt. (meth)acrylic ester, and 0-5 pts. wt. (meth)acrylic acid is dispersed in an aq. medium and polymerized in emulsion at 40-100°C. Then, coarse particles with particle diameters of 10μm or greater are removed from the resultant product.
MUNEMURA HISAMI
KITANO HISAO
