Title:
PRODUCTION OF HIGH-QUALITY BISPHENOL A
Document Type and Number:
Japanese Patent JP3190388
Kind Code:
B2
Abstract:
PURPOSE: To provide a process for evaporating and removing phenol from a bisphenol A.phenol crystalline adduct to obtain a high-purity bisphenol A having excellent hue in high efficiency.
CONSTITUTION: The objective production process is composed of a phenol evaporation stage to obtain bisphenol A having a phenol content of 1-5wt.% by evaporating a phenol solution containing bisphenol A formed from a crystalline adduct having a melt color of ≤15 APHA and exhibiting essentially neutral state with a thin-film evaporator at an oxygen concentration of ≤0.005vol.% and 160-185°C under a pressure of 15-60Torr and the 1st and 2nd stripping stages comprising the stripping of the bisphenol A obtained by the phenol evaporation stage by counter-currently contacting the bisphenol A with a stripping gas at 170-185°C under a pressure of ≤15Torr.
Inventors:
Koji Sakashita
Tetsuo Maeshima
Makoto Yasui
Noriyuki Yoneda
Sachio Asaoka
Tetsuo Maeshima
Makoto Yasui
Noriyuki Yoneda
Sachio Asaoka
Application Number:
JP30652391A
Publication Date:
July 23, 2001
Filing Date:
October 25, 1991
Export Citation:
Assignee:
Chiyoda Kakoh Construction Co., Ltd.
International Classes:
C07C37/74; C07C37/76; C07C37/84; C07C39/16; (IPC1-7): C07C39/16; C07C37/74; C07C37/76; C07C37/84
Domestic Patent References:
| JP63132850A | ||||
| JP395135A | ||||
| JP5117192A |
Attorney, Agent or Firm:
Toshiaki Ikeura (1 outside)