PURPOSE: To decrease the ghosts in the reproduction stage of a hologram obtd. by having a stage of forming a film having an antireflection function on a photosensitive substrate, stage for exposing the substrate, stage for removing the film by solvent cleaning and stage for developing an exposed image.
CONSTITUTION: A gelatin coating stage IW drying stage VIa or the respective stages up to a final developing stage VIIb are the same as conventional practical, except the antireflection film forming stage III and antireflection film removing stage V. The photosensitized substrate is further dried overnight at an ordinary temp. and thereafter vacuum deposition is executed in about 10-3W10-4Torr vacuum to form the antireflection film 30 on the surface of the photosensitized gelatin film 2A so as to have about 1,000 film thickness of potassium fluoride (FK), in the antireflection film forming stage which is the stage III. The photosensitive substrate 10 is fed to the developing stage after the antireflection film removing stage V. The removal of the antireflection treated film 30 is executed simultaneously with etching or developing treatment in a cleaning and etching stage VIa or initial developing stage VIb in the developing stage.
HIGAKI TAKASHI
UCHIKAWA HIDEFUSA
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