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Title:
PRODUCTION METHOD OF RETARDATION PLATE AND RETARDATION PLATE OBTAINED BY THE METHOD
Document Type and Number:
Japanese Patent JP2014098892
Kind Code:
A
Abstract:

To provide a retardation plate and a production method of the retardation plate with a simple production process, a low cost and high qualities.

The production method of a retardation plate includes steps of: preparing a first light-transmissive substrate 80 on which a pressure-sensitive adhesive layer 70 and a light-shielding pattern 20 are disposed; preparing a second light-transmissive substrate 10 and laminating one surface 101 thereof to the pressure-sensitive adhesive layer 70; forming a photo-alignable material layer 30 on the outer surface 102; irradiating the photo-alignable material layer 30 with first linearly polarized ultraviolet light through the second light-transmissive substrate 10 so as to form a first area 301 that is exposed and imparted with a first alignment direction and a second area 302 that is shielded by the light-shielding pattern 20 and not exposed; irradiating the second area 302 with second linearly polarized ultraviolet light to impart a second alignment direction in the second area 302; applying a liquid crystal material on an alignment layer that is a resultant of the photo-alignment material layer 30 subjected to the above irradiation steps; and curing the liquid crystal material.


Inventors:
HUNG WEI-CHE
WU YU-JUNE
CHIOU DA-REN
Application Number:
JP2013192830A
Publication Date:
May 29, 2014
Filing Date:
September 18, 2013
Export Citation:
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Assignee:
FAR EASTERN NEW CENTURY CORP
International Classes:
G02B5/30; B32B7/02; G02B30/25
Domestic Patent References:
JP2009226718A2009-10-08
JP2002303710A2002-10-18
JP2013518296A2013-05-20
JP2012014064A2012-01-19
Foreign References:
WO2011090355A22011-07-28
WO2012032920A12012-03-15
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Masatoshi Takahashi
Nagasaka Tomoyasu
Satoshi Deno