Title:
PRODUCTION METHOD OF SEMICONDUCTOR
Document Type and Number:
Japanese Patent JPS5219082
Kind Code:
A
Abstract:
PURPOSE: In order to produce a semiconductor device which reduces the voltage with the direction of easy flow with a extermely simple production process by means of selectively inducing the boron in the base-region.
Inventors:
KAWABE YUUNOSUKE
Application Number:
JP9471775A
Publication Date:
January 14, 1977
Filing Date:
August 05, 1975
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
H01L29/43; H01L21/225; H01L21/28; H01L21/331; H01L29/04; H01L29/08; H01L29/73; (IPC1-7): H01L21/225; H01L29/04; H01L29/08