Title:
PRODUCTION OF OPTICAL MASK
Document Type and Number:
Japanese Patent JPS54141572
Kind Code:
A
Abstract:
PURPOSE:To make possible correct exposure by exposing the patterns by which any slight deviation in the pitch of pattern generators may be readily discovered to form moire patterns and setting the pitch of the generator always at high accuracy. CONSTITUTION:In the manufacture of an optical mask using a pattern generator, two kinds of fringe form patterns which have a specified spacing and whose angles to the X axis vary respectively to 44.0 deg. and 46.0 are generated by the pattern generator and these fringe form patterns are double-exposed within the range of the master reticle, whereby the moire patterns are formed. These moire patterns are observed and the pattern generator is judged whether it is always in the correct pitch state so as to be always put to high accuracy state, whereby correct exposure is performed.
Inventors:
IINO TERUO
Application Number:
JP5031278A
Publication Date:
November 02, 1979
Filing Date:
April 26, 1978
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01L21/66; H01L21/027; H01L21/302; (IPC1-7): H01L21/302