PRODUCTION OF PARTIALLY SUBSTITUTED FLUOROSILANE

Title:

PRODUCTION OF PARTIALLY SUBSTITUTED FLUOROSILANE

Document Type and Number:

Japanese Patent JPH0710520

Kind Code:

A

Abstract:

PURPOSE: To obtain partially substd. fluorosilane from partially substd. dhlorosilane in a high yield.

CONSTITUTION: When partially substd. chlorosilane represented by a general formula SiHnCl4-n [where (n) is an integer of 1-3] is converted into corresponding partially substd. fluorosilane by a halogen exchange method, the objective partially substd. fluorosilane represented by a general formula SiHnF4-n [where (n) is an integer of 1-3] is produced by using anhydrous zinc fluoride having 1.0-10.0-m2/g specific surface area as a fluorinating agent.

More Like This:

WO/2008/056550

PROCESS FOR PRODUCING TRICHLOROSILANE AND TRICHLOROSILANE PRODUCING APPARATUS

Inventors:

HASHIMOTO TAKASHI
ARITSUKA MAKOTO
KOHARA SADAICHI
HARADA ISAO
MITSUMOTO ATSUHISA

Application Number:

JP14735593A

Publication Date:

January 13, 1995

Filing Date:

June 18, 1993

Export Citation:

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Assignee:

MITSUI TOATSU CHEMICALS

International Classes:

C01B33/107; (IPC1-7): C01B33/107

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