To obtain a photosensitive element which is capable of forming phosphor patterns having excellent suppression of edge fusion and embeddability into the spaces of a substrate having ruggedness, such as substrate for a PDP, etc., and having high accuracy and a uniform shape at a good yield and workability, the phosphor pattern having the high accuracy, the uniform shape and excellent luminance and a rear surface plate for a plasma display panel having these phosphor patterns.
This process includes respective stages of (I) a stage of forming (A) a photosensitive resin compsn. layer 6 contg. phosphors and (C) a resin layer 8 contg. particulates on a substrate 1 having ruggedness, (II) a stage for imagewise irradiating (C) the resin layer 8 contg. the (C) particulates and (A) the photosensitive resin compsn. layer 6 contg. the phosphors with active light, (III) a stage for forming patterns by removing (C) the resin layer 8 contg. the particulates and selectively removing (A) the photosensitive resin compsn. layer 6 contg. the phosphors and (IV) a stage for removing an org. component by baking.
TANAKA HIROYUKI
NOJIRI TAKESHI
TAI SEIJI
KAWAKAMI HIROYUKI
SHIMAMURA MARIKO
SUGIURA YUMIKO
KIMURA NAOKI
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