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Title:
PRODUCTION OF PHOTOMASK
Document Type and Number:
Japanese Patent JPS60144742
Kind Code:
A
Abstract:

PURPOSE: To reduce a process by forming an org. film on a transparent substrate, depicting a prescribed pattern thereon by using charge particle rays, curing the depicted region to convert said region to have the property to shut off UV and visible rays and removing the uncured region.

CONSTITUTION: An org. film 2 consisting of polymethyl acrylate is formed on the surface of a glass substrate 1 having a clean surface and a desired pattern is depicted on the film 2 by using ion beams 3. The film 2 is cured and converted to an org. film 2' having the property to shut off UV and visible light by selecting suitably the acceleration voltage of implanted ions and dosing quantity. The glass substrate 1 irradiated with the ion beams is treated with an acetone soln. to dissolve the uncured part and to leave only the cured org. film 2'. The process for production is thus reduced and the yield of production is improved.


Inventors:
AOYANAGI TAKASHI
Application Number:
JP16184A
Publication Date:
July 31, 1985
Filing Date:
January 04, 1984
Export Citation:
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Assignee:
NIPPON ELECTRIC CO
International Classes:
G03F1/00; G03F1/88; H01L21/027; (IPC1-7): G03F1/02; H01L21/30
Attorney, Agent or Firm:
Uchihara Shin



 
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