PRODUCTION OF PHOTOSENSITIVE POLYIMIDE PRECURSOR, AMIDATION OF POLYMER AND AMIDATION CATALYST OF POLYMER

Title:

PRODUCTION OF PHOTOSENSITIVE POLYIMIDE PRECURSOR, AMIDATION OF POLYMER AND AMIDATION CATALYST OF POLYMER

Document Type and Number:

Japanese Patent JPH09188762

Kind Code:

A

Abstract:

To obtain the above precursor useful for providing a final cured film having good storage stability and excellent mechanical characteristics by reacting an isocyanate compound having carbon double bond with a polyamic acid in the presence of a catalyst.

(A) A polyamic acid having a recurring unit of formula I (R' is ≥4C quadrivalent organic group; R2 is a divalent aromatic group or an Si- containing divalent organic group) is reacted with (B) an isocyanate compound of formula II (R3 to R5 are each independently H, an alkyl, phenyl, vinyl or propenyl; R6 is a divalent organic group) by using (C) phosphine oxide as a catalyst to provide the objective precursor having a recurring unit of formula III. The component C includes e.g. 3-methyl-1-phenyl-3 phosphorene 1 oxide.

Inventors:

YOSHIKAWA HARUHIKO
TAKEMOTO KAZUNARI
TANAKA JUN
ISODA KEIKO
KATAOKA FUMIO
UCHIMURA SHUNICHIRO

Application Number:

JP251596A

Publication Date:

July 22, 1997

Filing Date:

January 10, 1996

Export Citation:

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Assignee:

HITACHI LTD
HITACHI CHEMICAL CO LTD

International Classes:

G03F7/027; C08G18/34; C08G69/26; C08G69/28; C08G73/10; G03F7/038; (IPC1-7): C08G73/10; C08G18/34; C08G69/26

Attorney, Agent or Firm:

Kazuko Tomita

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