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Title:
PRODUCTION OF POLYAMIDEIMIDE RESIN SOLUBLE IN CRESOL TYPE SOLVENT
Document Type and Number:
Japanese Patent JPS5575417
Kind Code:
A
Abstract:

PURPOSE: To prepare heat resistant polyamideimide resin soluble in a cresol type solvent by reacting a polyisocyanate compound, lactam and polycarboxylic acid having acid anhydride group at a specific ration in a cresol type solvent.

CONSTITUTION: A polyisocyanate (a) having a isocyanurate ring obtained by trimerizing a polyisocyanate compound (4,4'-diphenylmethane diisocyanate, tolylene diisocyanate or the like) under the presence of a catalyst at about 70W160°C, an aromatic diisocyanate (b), lactam (c) such as -caprolactam and a cresol type solvent (d) are reacted at about 160W190°C for 1W3hrs. thereafter polycarboxylic acid (e) having acid anhydride group such as trimellit acid anhydride is added and the reaction is continued at about 200W220°C for about 10W20hrs. moreover, to a total isocyanate equivalent, the component (a) is used at 3W30wt% and the component (c) is used at 30W80wt%.


Inventors:
MUKAIYAMA YOSHIYUKI
SAKATA TOUICHI
Application Number:
JP14882078A
Publication Date:
June 06, 1980
Filing Date:
November 30, 1978
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08G18/00; C08G18/30; C08G18/34; C08G18/79; (IPC1-7): C08G18/30; C08G18/34
Domestic Patent References:
JPS5240599A1977-03-29
JP46029730A
JPS5030070A1975-03-26
JPS50155593A1975-12-15



 
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