Title:
ルテニウム錯体の製造
Document Type and Number:
Japanese Patent JP4118508
Kind Code:
B2
Abstract:
Ruthenium complexes of the formula I or IVwhereX, Y are anionic ligands,R is hydrogen or a substituted or unsubstituted C1-C20-alkyl radical or C6-C20-aryl radical andL1 and L2 are, independently of one another, uncharged electron donor ligands, are prepared by(a) reaction of RuX3 with L1 and L2 in an inert solvent in the presence of a reducing agent and hydrogen and(b) reaction with compounds of the formula IIwhere R is as defined above, in the presence or absence of water, and, if desired after isolation of the intermediate, with HY, [HL1]Y or [HL2]Y.
Inventors:
Schwab, Peter
Schulz, Michael
Wolf, Justin
Stol, Wolfram
Werner, Helmut
Schulz, Michael
Wolf, Justin
Stol, Wolfram
Werner, Helmut
Application Number:
JP2000507683A
Publication Date:
July 16, 2008
Filing Date:
August 20, 1998
Export Citation:
Assignee:
BASF SE
International Classes:
C07F9/50; B01J31/00; B01J31/22; C07F15/00; C08F4/80; C08F32/04; C08G61/08; B01J31/24
Foreign References:
| WO1997006185A1 | ||||
| US3935284 |
Attorney, Agent or Firm:
Satoshi Eto