Title:
PRODUCTION OF STRUCTURE RESISTANT TO SOLVENT
Document Type and Number:
Japanese Patent JP3165725
Kind Code:
B2
Abstract:
PURPOSE: To obtain a structure capable of maintaining resistance to heat, acid and alkali, which is dissolved in a solvent and formed and with the formed body having solvent resistance by cleaving the halomethyl group of the structure consisting of a halomethylated aromatic polycondensate.
CONSTITUTION: This structure consisting of an aromatic polycondensate having a halomethyl group is produced by dissolving a halomethylated aromatic polycondensate in a solvent such as dimethylformamide and dimethyl sulfoxide and forming the soln. into a membrane when used as a microfiltration membrane, etc. The halomethyl group linked to the polycondensate of the structure is ionically cleaved by proton acid or radically cleaved by the light such as UV rays and electron beam or the heat and then cross-linked to obtain the highly durable structure.
Inventors:
Nobuhiko Ohmura
Toshio Aritomi
Toshio Aritomi
Application Number:
JP2952092A
Publication Date:
May 14, 2001
Filing Date:
February 17, 1992
Export Citation:
Assignee:
Tokuyama Corporation
International Classes:
B01D71/64; B01D71/68; B01D71/82; C08G75/00; C08G75/20; C08J3/24; C08J5/18; (IPC1-7): B01D71/82; C08G75/20; C08J3/24; C08J5/18
Domestic Patent References:
| JP2269745A |