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Title:
PRODUCTION OF SYNTHETIC QUARTZ GLASS FOR ULTRAVIOLET RAY AND MEMBER OBTAINED BY USING THE SAME
Document Type and Number:
Japanese Patent JP2000290028
Kind Code:
A
Abstract:

To obtain glass having both of high transmissivity and high resistance to ultraviolet rays in the vacuum ultraviolet region by concentrically arranging plural pipes of hydrogen ejecting pipes and oxygen ejecting pipes around the pipe for ejecting an organic silicon compound being a raw material and specifying the ratio of the amount of gaseous oxygen to the amount of gaseous hydrogen.

A burner is constituted by concentrically arranging second pipes for ejecting gaseous hydrogen and third pipes for ejecting gaseous oxygen around a first pipe for ejecting an organic silicon compound being a raw material, further providing fourth pipes for ejecting gaseous hydrogen, providing fifth plural pipes for ejecting gaseous oxygen between the third and the fourth pipes, furthermore providing sixth pipes for ejecting gaseous hydrogen around the fourth pipes and providing seventh pipes for ejecting gaseous oxygen between the fourth and sixth pipes. The ratio (b/a) of the amount of gaseous oxygen (b) ejected from the third pipe to the amount of gaseous hydrogen (a) ejected from the second pipe is set to be not more than 0.5. The ratio (d/c) of the amount of gaseous oxygen (d) ejected from the fifth pipe to the amount of gaseous hydrogen (c) ejected from the fourth pipe is set to be not less than 0.55.


Inventors:
FUJIWARA MASASHI
YAMAGUCHI TOMOHISA
JINBO HIROKI
Application Number:
JP9598299A
Publication Date:
October 17, 2000
Filing Date:
April 02, 1999
Export Citation:
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Assignee:
NIKON CORP
International Classes:
C03B8/04; C03B20/00; C03C3/06; G05D11/02; (IPC1-7): C03B8/04; C03B20/00; C03C3/06; G05D11/02