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Patent Searching and Data


Title:
PRODUCTION OF TARGET FOR SPUTTERING
Document Type and Number:
Japanese Patent JPH02267262
Kind Code:
A
Abstract:

PURPOSE: To produce a uniform target for magneto-optical use by wet-mixing powders of different metals in an org. solvent, filling the mixture into a casting mold in a slurried state, drying the mixture, putting a mother alloy based on rare earth and transition metals on the dried mixture, heating and infiltrating the mother alloy.

CONSTITUTION: Rare earth and transition metals such as Dy and Fe are melted by induction heating in an inert atmosphere to obtain a mother alloy. Powders of different transition metals such as Fe and Co are wet-mixed in an org. solvent such as chlorofluorocarbon by stirring. This mixture is filled into a casting mold in a slurried state and dried to remove the org. solvent. The mother alloy is put on the dried mixture in the mold, heated to the m.p. of the alloy or above in vacuum and infiltrated into the mixture. A uniform target for sputtering for forming the film of a magneto-optical recording medium is obtd.


Inventors:
YAMAGISHI TOSHIHIKO
AOYAMA AKIRA
Application Number:
JP8897689A
Publication Date:
November 01, 1990
Filing Date:
April 07, 1989
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
C23C14/34; (IPC1-7): C23C14/34
Attorney, Agent or Firm:
Kisaburo Suzuki (1 outside)