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Patent Searching and Data


Title:
PRODUCTION OF THIN SUPERCONDUCTOR FILM
Document Type and Number:
Japanese Patent JPH02156075
Kind Code:
A
Abstract:

PURPOSE: To increase the efficiency of capture of vapor phase superconductor ceramics on a body for deposition by irradiating the ceramics with laser beam to ionize the atoms of the ceramics and by impressing voltage whose polarity is reverse to that of the ionized atoms on the body.

CONSTITUTION: A target 31 is irradiated with laser beam 32 for generating clusters to generate clustery sputtered particles 34a from the target 31. The particles 34a are ionized by irradiation with laser beam 33 for ionization and the ionized particles are decomposed to generate positively ionized atoms 34. Negative voltage is impressed on a body 35 for deposition and the ionized atoms 34 are attracted to the body 34 and deposited. By this method, a high quality thin superconductor film can be formed at a high rate in a high yield of the starting material.


Inventors:
KONDO HIDEYUKI
HAGINO SADAAKI
TAKESHITA TAKUO
SUGIHARA TADASHI
Application Number:
JP31174688A
Publication Date:
June 15, 1990
Filing Date:
December 09, 1988
Export Citation:
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Assignee:
MITSUBISHI METAL CORP
International Classes:
C04B41/87; C01B13/14; C01G1/00; C01G29/00; C23C14/08; (IPC1-7): C01B13/14; C01G29/00; C04B41/87; C23C14/08
Domestic Patent References:
JPS63264819A1988-11-01
JPS61220415A1986-09-30
Attorney, Agent or Firm:
Abe Ituro