Title:
PROGRAMMED PRODUCTION OF MASK ROM
Document Type and Number:
Japanese Patent JP3277175
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To increase a pattern forming parameter area by obtaining a sufficiently flat program code through use of a specified principle.
SOLUTION: A link group of decode B of the program code A of a mask A40 is obtained and then program code C is obtained. Furthermore, the program code A is linked with the inversion code B' of decode B to obtain program code D. Decode B is a program code where 0 and 1 are mixed. The program codes C and D are divided, respectively, into masks C60 and D70 which are then exposed twice independently thus obtaining results similar to those obtained by using the mask A40 independently. Since the program code A is linked into groups, two sets of sufficiently uniform program code are obtained and the pattern forming parameter area can be increased.
Inventors:
Wu
Zhang Rui Kin
Yang Shun Yi
Hayashi
King Myeongjong
Zhang Rui Kin
Yang Shun Yi
Hayashi
King Myeongjong
Application Number:
JP25465799A
Publication Date:
April 22, 2002
Filing Date:
September 08, 1999
Export Citation:
Assignee:
Wanghong Electronics Co., Ltd.
International Classes:
H01L21/027; G03F1/00; G03F1/68; G11C17/08; H01L21/8246; H01L27/112; (IPC1-7): H01L21/8246; G03F1/08; G11C17/08; H01L21/027; H01L27/112
Domestic Patent References:
| JP200168566A | ||||
| JP9223751A | ||||
| JP5651095A |
Attorney, Agent or Firm:
Koetsu Kokubun
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