Title:
PROJECTION ALIGNER AND PROJECTION EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP3212197
Kind Code:
B2
Abstract:
PURPOSE: To stabilize exposure process using deformation lighting by allowing the image surface of an image-forming optical system forming a number of images of light source two-dimensionally or an aperture laid out near it to have a pair of light transmission parts which are linearly symmetrical and in nearly trapezoid shape.
CONSTITUTION: The title device is provided with an image-forming optical system for forming a number of images of light source two-dimensionally, the image surface of the image-forming optical system or an aperture 60 laid out near it, and Fourier transformation optical system for optically performing Fourier transformation of the image surface of the image-forming optical system or a surface near it. Further, it is also provided with a photo mask which is installed on the Fourier transformation surface of Fourier transformation optical system or near it and a projection optical system for focusing light through the photo mask on a substrate where a light-sensitive material is applied, where an aperture 60 consists of a pair of light transmission regions 61 in nearly trapezoid shape and a light-shielding region 62 and a pair of light transmission regions 61 are laid out linearly symmetrical with respect to the center axis of the aperture 60 by setting the bottom side of the trapezoid shape in parallel with the center axis.
Inventors:
Junji Miyazaki
Teruo Miyamoto
Naohisa Tamada
Takuya Matsushita
Teruo Miyamoto
Naohisa Tamada
Takuya Matsushita
Application Number:
JP23790893A
Publication Date:
September 25, 2001
Filing Date:
September 24, 1993
Export Citation:
Assignee:
Mitsubishi Electric Corporation
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP5217841A |
Attorney, Agent or Firm:
Kenichi Hayase