Title:
PROJECTION ALIGNER, MASK STRUCTURE USED FOR THE SAME, EXPOSURE METHOD, SEMICONDUCTOR DEVICE MANUFACTURED USING THE PROJECTION ALIGNER, AND MANUFACTURE OF THE SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2000286187
Kind Code:
A
Abstract:
To extend service life of a mask and to prevent decrease in exposure accuracy by preventing adhesion and deposition of contamination onto the surface of a mask.
A mask structure body E having a light catalyst at least in part is used, and an auxiliary light source K for applying auxiliary light appropriate to the mask structural in a chamber N, that is separate from an exposure chamber O, is provided. Another chamber N may be newly provided or a mask cassette chamber for storing the mask structure, when no exposure is made to a body F to be transferred. The auxiliary light source K can also be provided at the exposure chamber O.
Inventors:
CHIBA KEIKO
Application Number:
JP9352399A
Publication Date:
October 13, 2000
Filing Date:
March 31, 1999
Export Citation:
Assignee:
CANON KK
International Classes:
G03F1/22; G03F1/24; G03F1/40; H01L21/027; G03F7/20; (IPC1-7): H01L21/027; G03F1/16
Attorney, Agent or Firm:
Tetsuya Ito (1 outside)