To enable controlling substrate carrying speed and prealignment pin driving speed, by detecting the substrate thickness, on the basis of a least one out of outputs of a means measuring the distance between a sensitized substrate and a mask in the optical axis direction, and a means moving the sensitized substrate to an image position.
In the state that a sensitized substrate 6 is not held, the distance in the optical axis direction of a projection optical system 7 between the surface of a substrate stage 4 and a mask 5 is measured with autofocus sensors 10A-10D. When the sensitized substrate 6 is mounted on the substrate stage 4, the distance in the optical axis direction of the projection optical system 7 between the surface of the sensitized substrate 6 and the mask 5 is again measured with the autofocus sensors 10A-10D. In a plate carrying speed control part 21 and a prealignment pin speed control part 22, a distance as the difference between the interval corresponding to the stored distance between the substrate stage and the mask and the interval corresponding to the distance between the sensitized substrate and the mask is obtained, and the thickness of the sensitized substrate 6 is obtained on the basis of the obtained distance.
| WO/2011/104173 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| JP5429283 | Exposure device and device manufacturing method |
| WO/2007/057673 | LITHOGRAPHIC APPARATUS |
ITO MASANOBU
GOTO EIJI
YANAGIHARA MASAMITSU
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