Title:
ポリマー中の保護基、フォトレジスト、およびマイクロリソグラフィー法
Document Type and Number:
Japanese Patent JP2004514952
Kind Code:
A
Abstract:
The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as 193 nm and 157 nm.
Inventors:
Andrew E. Failing
Via Cheslav Alexandrovich Petrov
Frank El Shut The Third
Bruce Edmund Smart
Via Cheslav Alexandrovich Petrov
Frank El Shut The Third
Bruce Edmund Smart
Application Number:
JP2002546945A
Publication Date:
May 20, 2004
Filing Date:
November 26, 2001
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F216/16; C08F224/00; C08F232/04; G03F7/004; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; C08F216/16; C08F224/00; C08F232/04; H01L21/027
Domestic Patent References:
| JP2001209181A | 2001-08-03 | |||
| JP2001056557A | 2001-02-27 | |||
| JP2001048931A | 2001-02-20 | |||
| JP2002091005A | 2002-03-27 | |||
| JP2001278919A | 2001-10-10 | |||
| JPH11218918A | 1999-08-10 | |||
| JP2000187329A | 2000-07-04 | |||
| JP2000275845A | 2000-10-06 |
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe