Title:
カーボンナノ材料の形成に使用するガスの提供
Document Type and Number:
Japanese Patent JP2012516278
Kind Code:
A
Abstract:
In a Chemical Vapour Deposition (CVD) process for forming carbon nanomaterials, a supply of acetylene gas is filtered by a filter to remove a volatile hydrocarbon gas before the acetylene gas is provided to a mass flow controller. The mass flow controller can mix the filtered acetylene gas with a supply of the volatile hydrocarbon gas so that a gas mixture has a selected proportion of the volatile hydrocarbon gas. The filter performs the filtering by passing the acetylene gas over active carbon.
Inventors:
Jensen, Ben Paul
Chen, Guan You
Chen, Guan You
Application Number:
JP2011546947A
Publication Date:
July 19, 2012
Filing Date:
January 28, 2010
Export Citation:
Assignee:
Sally Nano Systems Limited
International Classes:
C01B31/02
Domestic Patent References:
| JPH0570115A | 1993-03-23 | |||
| JP2007222803A | 2007-09-06 | |||
| JP2004148257A | 2004-05-27 | |||
| JPH062682B2 | 1994-01-12 | |||
| JP2007525615A | 2007-09-06 | |||
| JP2001079330A | 2001-03-27 |
Attorney, Agent or Firm:
Fukami patent office