純水リサイクルシステム

Japanese Patent JP7068050

B2

To provide a pure water recycle system which permits processing of a processing device even after stopping a chip removing device.SOLUTION: A pure water recycle system includes a device 3 which receives waste water from a processing device 2 and removes a chip and a device 4 which turns fresh water provided by removing the chip into pure water. Therein, the device 3 for removing the chip includes a first tank which has a first flow inlet arranged on a position lower than a waste water port of the processing device 2 and allows waste water to flow into the flow inlet from the waste water port, a means 32 which removes the chip in the first tank and a port 33 which causes waste water to overflow from the first tank, the pure water manufacturing device 4 includes a second tank for inputting water provided by removing the chip with the chip removing means 32, a means 43 which regenerates waste water into pure water and a first pump which supplies water to a pure water regeneration means 43 from the second tank. Therein, the second pump is provided with a flow inlet on a position lower than the overflow port 33 which causes waste water from the overflow port 33 to flow-in and, upon the chip removing means 32 maintenance, causes overflow waste water to flow into the second tank from the second flow inlet, circulates water and permits the processing.SELECTED DRAWING: Figure 1

JPH0744444	[Name of invention] Abrasive waste liquid treatment device
JP5557391	The method and system for manufacturing a wafer-like slice from substrate material
JPH0760155	LIQUID PURIFYING DEVICE

Jun Suwano
Hiroyuki Kashiwagi

JP2018106806A

May 16, 2022

June 04, 2018

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Disco Co., Ltd.

B24B55/03; B03C5/02; B23Q11/10; C02F9/12

JP2015112663A
JP2013123781A

Patent Business Corporation Tokyo Alpa Patent Office

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