Title:
PURIFICATION METHOD FOR HARMFUL GAS
Document Type and Number:
Japanese Patent JPH08294617
Kind Code:
A
Abstract:
PURPOSE: To safely and efficiently remove haloganate silicate gas which is used in a semiconductor production process and is contained in exhaust gas.
CONSTITUTION: Gas containing halogenated silicate is contacted with a purification agent in which an alkali compound such as potassium hydroxide is added to metal oxide containing copper oxide (II) and manganese oxide as main components.
Inventors:
SHIMADA TAKASHI
HATAKEYAMA TOSHIYA
KASATANI HISAFUMI
HATAKEYAMA TOSHIYA
KASATANI HISAFUMI
Application Number:
JP12593595A
Publication Date:
November 12, 1996
Filing Date:
April 26, 1995
Export Citation:
Assignee:
JAPAN PIONICS
International Classes:
B01D53/34; B01D53/68; B01J20/06; (IPC1-7): B01D53/68; B01D53/34; B01J20/06
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