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Title:
PURIFICATION OF ORGANOSILICON COMPOUND
Document Type and Number:
Japanese Patent JPS63316788
Kind Code:
A
Abstract:

PURPOSE: To readily and efficiently remove trace amounts of halogenated organic compound which are impurities and obtain the titled high-purity compound, by bringing an organosilicon compound containing impurities into contact with an organolithium compound.

CONSTITUTION: An organosilicon compound (example; organosilanes such as diemthyldichlorosilane or organosiloxanes such as hexamethyldisiloxane) containing a halogenated organic compound such as methyl chloride, chlorobenzene and biphenyl chloride as an impurity is brought into contact with an organolithium compound (example; methyl lithium, etc.) while stirring, preferably at ≤50°C and then the organosilicon compound is separated to afford the aimed compound.


Inventors:
SHINOHARA NORIO
INOUE YOSHIBUMI
Application Number:
JP15316187A
Publication Date:
December 26, 1988
Filing Date:
June 19, 1987
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
C07F7/02; C07B63/02; (IPC1-7): C07F7/02