Title:
PURIFYING METHOD FOR SILICON PRODUCT
Document Type and Number:
Japanese Patent JP2003332292
Kind Code:
A
Abstract:
To provide a purifying method for a silicon product with which a metal contamination material is almost completely removed.
After an oxidized film is removed by immersing the silicon product in hydrofluoric acid and a contaminated top layer is dissolved and removed by immersing the silicon product in a mixed liquid of hydrofluoric acid and nitric acid, the adsorbed metal contamination material on a surface of the silicon product is liberated by immersing the silicon product in a mixed liquid of hydrofluoric acid, nitric acid and hydrochloric acid and afterwards, the silicon product is rinsed in pure water and naturally dried.
Inventors:
HAN RENSHO
TOKUTAKE TAKEO
TOKUTAKE TAKEO
Application Number:
JP2002218038A
Publication Date:
November 21, 2003
Filing Date:
July 26, 2002
Export Citation:
Assignee:
TOSHIBA CERAMICS CO
International Classes:
B08B3/08; B01D12/00; C23F1/24; H01L21/304; (IPC1-7): H01L21/304; B01D12/00; B08B3/08; C23F1/24
Attorney, Agent or Firm:
Yujiro Taka
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