To provide a quartz crucible for pulling a silicon single crystal, which does not fall down even when it is used in a high temperature environment and with which the silicon single crystal can be pulled in a good productivity without interruption of pulling the single crystal.
The quartz crucible for pulling the silicon single crystal has a transparent layer being brought into contact with a silicon melt and an opaque layer provided at the outer periphery of the transparent layer and containing many air bubbles. The linear expansion coefficients of the transparent layer and the opaque layer above the liquid level in the thickness direction are within a range of 0.001-0.005% and a range of 5-15%, respectively, before or after pulling the silicon single crystal.
KIKUCHI TOSHIYUKI
MIZUNO KOSHIN
OBATA NAOYUKI
JP2004352580A | 2004-12-16 | |||
JP2001233629A | 2001-08-28 |
Shunguchi Sekiguchi
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