PURPOSE: To analyze many elements simultaneously in a short time with high accuracy by directly introducing a mixed gas obtained by diluting a high purity gas with argon gas to a predetermined concentration to a high frequency induction coupling plasma, so that impurities is quantified by emission spectral analysis.
CONSTITUTION: A high purity gas to be measured is diluted to a predetermined concentration by argon gas and directly introduced to a high frequency induction coupling plasma (ICP) analyzing device 3. It is desirable that the high purity gas is introduced not less than 0.1ml/min., and the argon gas is enough to be twice the amount of the analyzing sample. Elements contained in the analyzing sample are dissociated and excited by argon plasma, consequently emitting lights. The emitted lights are divided by a emission spectral analyzer and all the necessary wavelengths of the measured elements are measured under the same conditions. Accordingly, many elements can be analyzed simultaneously with high accuracy and in a short time.
IWATA HIDEO
SAKASHITA AKIKO
Next Patent: INTRODUCING AND MONITORING METHOD OF SAMPLE IN I.C.P EMISSION SPECTRAL ANALYZING DEVICE